Title :
1Mb 4T-2MTJ nonvolatile STT-RAM for embedded memories using 32b fine-grained power gating technique with 1.0ns/200ps wake-up/power-off times
Author :
Ohsawa, T. ; Koike, H. ; Miura, S. ; Honjo, H. ; Tokutome, K. ; Ikeda, S. ; Hanyu, T. ; Ohno, H. ; Endoh, T.
Author_Institution :
Center for Spintronics Integrated Syst., Tohoku Univ., Sendai, Japan
Abstract :
A 1Mb nonvolatile STT-RAM using the 4T-2MTJ cell is designed and fabricated using 90nm CMOS and MTJ processes. 32 cells along a word line (WL) are simultaneously power-gated with quick wake-up/power-off times of 1.0ns/200ps, respectively, to reduce operation power and to eliminate standby power of the chip. The cell is experimentally shown to retain data with static noise margin (SNM) 0.32V under Vdd=1V. The 1Mb chip with 2.19μm2 cell is successfully operated with array access time of 8ns and read power of 10.7mW under 10ns cycle. The macro size of 1Mb STT-RAM is predicted to become smaller than the 1Mb 6T-SRAM in 45nm and beyond.
Keywords :
CMOS memory circuits; SRAM chips; 1Mb 4T-2MTJ nonvolatile STT-RAM cell; 32b fine-grained power gating technique; CMOS processes; MTJ processes; SNM; embedded memories; power 10.7 mW; size 45 nm; size 90 nm; static noise margin; time 1.0 ns; time 10 ns; time 200 ps; time 8 ns; voltage 0.32 V; voltage 1 V; wake-up-power-off times; word line; Arrays; Logic gates; Microprocessors; Nonvolatile memory; Switches; Tin;
Conference_Titel :
VLSI Circuits (VLSIC), 2012 Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4673-0848-9
Electronic_ISBN :
978-1-4673-0845-8
DOI :
10.1109/VLSIC.2012.6243782