Fabrication and Characterization of Two-Dimensional Photonic Crystal on Silicon by Efficient Methods

Author

Xingsheng Xu ; Chunxia Wang ; Fang Li ; Guiguang Xiong ; Yuliang Liu ; Hongda Chen

Author_Institution

State Key Lab. Integrated Optoelectron., Chinese Acad. of Sci., Beijing

fYear

2006

fDate

13-15 Sept. 2006

Firstpage

69

Lastpage

71

Abstract

Two-dimensional photonic crystals working in near infrared region are fabricated into silicon-on-insulator wafer by 248-nm deep UV lithography. We present an efficient way to measure the photonic crystal waveguide´s light transmission spectra at given polarization states

Keywords

integrated optics; light polarisation; light transmission; optical fabrication; optical materials; optical testing; optical waveguides; photonic crystals; silicon-on-insulator; ultraviolet lithography; 248 nm; Si-SiO₂; deep UV lithography; light transmission spectra; polarization states; silicon-on-insulator wafer; two-dimensional photonic crystal waveguide characterization; two-dimensional photonic crystal waveguide fabrication; Etching; Lithography; Optical device fabrication; Optical fiber polarization; Optical polarization; Optical refraction; Optical scattering; Optical waveguides; Photonic crystals; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Group IV Photonics, 2006. 3rd IEEE International Conference on

Conference_Location

Ottawa, Ont.

Print_ISBN

1-4244-0096-1

Type

conf

DOI

10.1109/GROUP4.2006.1708168

Filename

1708168