Interaction of multiple brushes on a slipring

Author

Burton, Ralph A. ; Burton, R. Gaines

Author_Institution

Burton Technol. Inc., Raleigh, NC, USA

fYear

1991

fDate

6-9 Oct. 1991

Firstpage

156

Lastpage

158

Abstract

The increase of contact resistance is calculated for brush contact on a slipring, segmented into a sequence of rectangular contact patches, evenly spaced. This approximates the condition of liquid-metal-wetted brushes where uniform contact may occur over the rectangular brush footprint. A Fourier series expansion shows that for wide spacing of the footprints a component of resistance arises from the fact that the current input is segmented. The resistance is mainly dependent upon the logarithm of spacing. As the separation becomes narrower than the contact bands, there is a drop in the segmentation component of resistance.<>

Keywords

brushes; contact resistance; electrical contacts; Fourier series expansion; brush contact; brush interaction; evenly spaced contacts; multiple brushes; rectangular brush footprint; rectangular contact patches; segmentation component of resistance; sliding contacts; slip-rings; slipring; uniform contact; Brushes; Conductive films; Contact resistance; Coordinate measuring machines; Current density; Electric resistance; Fourier series; Poles and towers; Space technology; Surface resistance;

fLanguage

English

Publisher

ieee

Conference_Titel

Electrical Contacts, 1991. Proceedings of the Thirty-Seventh IEEE Holm Conference on

Conference_Location

Chicago, IL, USA

Print_ISBN

0-7803-0231-1

Type

conf

DOI

10.1109/HOLM.1991.170818

Filename

170818