DocumentCode
2661839
Title
Characteristic temperature of a tunneling-injection quantum dot laser
Author
Han, Dae-Seob ; Asryan, Levon V.
Author_Institution
Virginia Tech., Virginia
fYear
2007
fDate
12-14 Dec. 2007
Firstpage
1
Lastpage
2
Abstract
High temperature stability of threshold current has been predicted for the semiconductor quantum dot (QD) laser. An ideal situation would be temperature-insensitive threshold current density j0 i.e. the characteristic temperature (a widely-accepted figure of merit of any diode laser from the viewpoint of temperature-stability of its y´th) defined as T0=(partln jth/partT)-1. In this paper the authors study the effect of out-tunneling leakage of carriers from QDs and hence of recombination outside QDs on the T-dependence of j0. The authors show that, even in the presence of such leakage, T0 remains very high. The authors analyze T0 versus the parameters of a GalnAsP/InP heterostructure lasing near 1.55 mum.
Keywords
arsenic alloys; carrier mobility; gallium alloys; indium alloys; phosphorus alloys; quantum dot lasers; temperature; tunnelling; GaInAsP-InP; characteristic temperature; high temperature stability; out-tunneling leakage; semiconductor quantum dot laser; temperature-insensitive threshold current density; tunneling-injection quantum dot laser; Charge carrier processes; Educational institutions; Laser stability; Laser theory; Quantum dot lasers; Radiative recombination; Spontaneous emission; Temperature; Threshold current; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2007 International
Conference_Location
College Park, MD
Print_ISBN
978-1-4244-1892-3
Electronic_ISBN
978-1-4244-1892-3
Type
conf
DOI
10.1109/ISDRS.2007.4422551
Filename
4422551
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