• DocumentCode
    2661839
  • Title

    Characteristic temperature of a tunneling-injection quantum dot laser

  • Author

    Han, Dae-Seob ; Asryan, Levon V.

  • Author_Institution
    Virginia Tech., Virginia
  • fYear
    2007
  • fDate
    12-14 Dec. 2007
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    High temperature stability of threshold current has been predicted for the semiconductor quantum dot (QD) laser. An ideal situation would be temperature-insensitive threshold current density j0 i.e. the characteristic temperature (a widely-accepted figure of merit of any diode laser from the viewpoint of temperature-stability of its y´th) defined as T0=(partln jth/partT)-1. In this paper the authors study the effect of out-tunneling leakage of carriers from QDs and hence of recombination outside QDs on the T-dependence of j0. The authors show that, even in the presence of such leakage, T0 remains very high. The authors analyze T0 versus the parameters of a GalnAsP/InP heterostructure lasing near 1.55 mum.
  • Keywords
    arsenic alloys; carrier mobility; gallium alloys; indium alloys; phosphorus alloys; quantum dot lasers; temperature; tunnelling; GaInAsP-InP; characteristic temperature; high temperature stability; out-tunneling leakage; semiconductor quantum dot laser; temperature-insensitive threshold current density; tunneling-injection quantum dot laser; Charge carrier processes; Educational institutions; Laser stability; Laser theory; Quantum dot lasers; Radiative recombination; Spontaneous emission; Temperature; Threshold current; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2007 International
  • Conference_Location
    College Park, MD
  • Print_ISBN
    978-1-4244-1892-3
  • Electronic_ISBN
    978-1-4244-1892-3
  • Type

    conf

  • DOI
    10.1109/ISDRS.2007.4422551
  • Filename
    4422551