• DocumentCode
    2662129
  • Title

    Temperature dependent I-V characteristics of AlGaN/GaN HBTs and GaN BJTs

  • Author

    Xing, Huili G. ; Mishra, Umesh K.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA, USA
  • fYear
    2004
  • fDate
    4-6 Aug. 2004
  • Firstpage
    195
  • Lastpage
    200
  • Abstract
    DC I-V characteristics of AlGaN/GaN heterojunction bipolar transistors (HBTs) and GaN homojunction bipolar transistors (BJTs) are analyzed in the temperature range of 200-450 K. At low current levels, the adverse effects of poor ohmic contacts coupled with paths of high leakage make it difficult to extract intrinsic device operation ["Explanation of anomalous current gain observed in GaN based bipolar transistors", Xing et al. IEEE Elect. Dev. Lett. 24(1) 2003:p.4-6]. At intermediate current levels, owing to enhanced ionization of Mg in the base, the HBTs show an increase in current gain resulting from mitigated current crowding, and the BJTs show a decrease in current gain resulting from reduction of emitter injection coefficient. The offset voltage dependence on temperature is also explained.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; heterojunction bipolar transistors; ohmic contacts; wide band gap semiconductors; 200 to 450 K; AlGaN-GaN; current crowding; emitter injection coefficient; heterojunction bipolar transistors; homojunction bipolar transistors; intrinsic device operation; ohmic contacts; temperature dependent I-V characteristics; Aluminum gallium nitride; Bipolar transistors; Gallium nitride; Heterojunction bipolar transistors; Ionization; Ohmic contacts; Proximity effect; Temperature dependence; Temperature distribution; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High Performance Devices, 2004. Proceedings. IEEE Lester Eastman Conference on
  • Print_ISBN
    981-256-196-X
  • Type

    conf

  • DOI
    10.1109/LECHPD.2004.1549694
  • Filename
    1549694