DocumentCode
2662129
Title
Temperature dependent I-V characteristics of AlGaN/GaN HBTs and GaN BJTs
Author
Xing, Huili G. ; Mishra, Umesh K.
Author_Institution
Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA, USA
fYear
2004
fDate
4-6 Aug. 2004
Firstpage
195
Lastpage
200
Abstract
DC I-V characteristics of AlGaN/GaN heterojunction bipolar transistors (HBTs) and GaN homojunction bipolar transistors (BJTs) are analyzed in the temperature range of 200-450 K. At low current levels, the adverse effects of poor ohmic contacts coupled with paths of high leakage make it difficult to extract intrinsic device operation ["Explanation of anomalous current gain observed in GaN based bipolar transistors", Xing et al. IEEE Elect. Dev. Lett. 24(1) 2003:p.4-6]. At intermediate current levels, owing to enhanced ionization of Mg in the base, the HBTs show an increase in current gain resulting from mitigated current crowding, and the BJTs show a decrease in current gain resulting from reduction of emitter injection coefficient. The offset voltage dependence on temperature is also explained.
Keywords
III-V semiconductors; aluminium compounds; gallium compounds; heterojunction bipolar transistors; ohmic contacts; wide band gap semiconductors; 200 to 450 K; AlGaN-GaN; current crowding; emitter injection coefficient; heterojunction bipolar transistors; homojunction bipolar transistors; intrinsic device operation; ohmic contacts; temperature dependent I-V characteristics; Aluminum gallium nitride; Bipolar transistors; Gallium nitride; Heterojunction bipolar transistors; Ionization; Ohmic contacts; Proximity effect; Temperature dependence; Temperature distribution; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
High Performance Devices, 2004. Proceedings. IEEE Lester Eastman Conference on
Print_ISBN
981-256-196-X
Type
conf
DOI
10.1109/LECHPD.2004.1549694
Filename
1549694
Link To Document