• DocumentCode
    2663487
  • Title

    Design and Fabrication of a MEMS X-ray Optic using Anisotropic Wet Etching of Si Wafers

  • Author

    Koshiishi, M. ; Ezoe, Y. ; Mita, M. ; Mitsuda, K. ; Takano, T. ; Maeda, R. ; Ishisaki, Y.

  • Author_Institution
    Inst. of Space & Astronaut. Sci., Japan Aerosp. Exploration Agency, Kanagawa
  • fYear
    2006
  • fDate
    21-24 Aug. 2006
  • Firstpage
    84
  • Lastpage
    85
  • Abstract
    In this paper, we report on the development of X-ray optics using anisotropic wet etching of silicon wafers. Both X-ray mirrors and an optics mount are fabricated fully using the MEMS technologies
  • Keywords
    X-ray optics; elemental semiconductors; etching; micro-optomechanical devices; micromirrors; optical design techniques; optical fabrication; silicon; MEMS X-ray optics design; MEMS X-ray optics fabrication; Si; X-ray mirrors; anisotropic wet etching; optics mount; silicon wafers; Anisotropic magnetoresistance; Geometrical optics; Micromechanical devices; Mirrors; Optical design; Optical device fabrication; Optical devices; Silicon; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical MEMS and Their Applications Conference, 2006. IEEE/LEOS International Conference on
  • Conference_Location
    Big Sky, MT
  • Print_ISBN
    0-7803-9562-X
  • Type

    conf

  • DOI
    10.1109/OMEMS.2006.1708276
  • Filename
    1708276
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2663487