Integration of SOI and SU-8 in a Surface-Micromachining-like Process and Its Application in Micro-Optical Systems

Author

Chiu, Yi ; Wu, Chung-Wei ; Zhuang, Zhi-Wei ; Chiou, Jin-Chern ; Shieh, Han-Ping D.

Author_Institution

Dept. of Electr. & Control Eng., Nat. Chiao Tung Univ., Hsinchu

fYear

2006

fDate

21-24 Aug. 2006

Firstpage

140

Lastpage

141

Abstract

This paper reports a novel fabrication process to integrate SU-8 negative resist on silicon-on-insulator (SOI) substrates. In this surface-micromachining-like process, the device layer of the SOI substrate and the SU-8 layer are two structural layers, separated by an oxide sacrificial layer. The stress-free and single-crystalline nature of the top SOI layer and the transparency of SU-8 in the visible spectrum range make this process ideal for integration of mechanical structures, optical devices, photo detectors, and circuits

Keywords

integrated optics; micro-optics; micromachining; optical fabrication; photodetectors; silicon-on-insulator; SU-8 negative resist; fabrication process; mechanical structures; microoptical system; optical device; oxide sacrificial layer; photodetectors; silicon-on-insulator substrate; single-crystalline nature SOI substrates; stress-free SOI layer; surface-micromachining-like process; visible spectrum; Circuits; Diodes; Micromachining; Mirrors; Optical detectors; Optical device fabrication; Optical devices; Optical sensors; Optical signal processing; Residual stresses;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Their Applications Conference, 2006. IEEE/LEOS International Conference on

Conference_Location

Big Sky, MT

Print_ISBN

0-7803-9562-X

Type

conf

DOI

10.1109/OMEMS.2006.1708304

Filename

1708304