• DocumentCode
    2664361
  • Title

    Influence of Proton Irradiation dose on the Performance of Local Lifetime Controlled Power Diode with Proximity Gettering of Platinum

  • Author

    Han, B.D. ; Hu, D.Q. ; Xie, S.S. ; Jia, Y.P. ; Kang, B.W.

  • Author_Institution
    Coll. of Electron. & Control Eng., Beijing Univ. of Sci. & Technol.
  • Volume
    2
  • fYear
    2006
  • fDate
    14-16 Aug. 2006
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    Based on proximity gettering of platinum by vacancy defects which are induced by proton irradiation, local platinum doping is obtained. It is used as a local lifetime control technology in high-power diodes. The theoretical dependence of electrical active Pt concentration Cpts on irradiation induced defects concentration Cv is also studied. The diodes´ reverse performance parameters are measured. They are functions of irradiation dose. For low proton irradiation dose, the gettered quantities of platinum by irradiation induced defects are enhanced when the irradiation dose increases. This can improve the performances of the device. But when the proton irradiation dose is high enough, the peak concentration of gettered platinum tends saturation. Further more, for deep junction device, the side effect brought by high dose irradiation will decrease the platinum gettering efficiency and the performances of the device degenerated under higher irradiation dose. On the base of theoretical study, we improved the device structure and manufacture process, a higher peak concentration is obtained. The recovery speed has been improved further
  • Keywords
    getters; platinum; power semiconductor diodes; proton effects; radiation hardening (electronics); vacancies (crystal); Pt; diodes reverse performance parameters; electrical active platinum concentration; irradiation induced defects concentration; lifetime controlled power diode; platinum doping; platinum gettering efficiency; proton irradiation dose; vacancy defects; Anodes; Doping; Gettering; Leakage current; Manufacturing processes; P-i-n diodes; Photonic band gap; Platinum; Protons; Sputtering; gettering efficiency; irradiation dose; localized platinum doping; platinum gettering; power diode;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Electronics and Motion Control Conference, 2006. IPEMC 2006. CES/IEEE 5th International
  • Conference_Location
    Shanghai
  • Print_ISBN
    1-4244-0448-7
  • Type

    conf

  • DOI
    10.1109/IPEMC.2006.4778169
  • Filename
    4778169