DocumentCode :
2665683
Title :
Dominant factors determining the threshold voltage for thin film electroluminescent devices
Author :
Hirabayashi, Katsuhiko ; Shibata, Tomohiro ; Kozawaguchi, Haruki
Author_Institution :
Opto-electronics Lab., NTT, Ibaraki, Japan
fYear :
1988
fDate :
4-6 Oct. 1988
Firstpage :
42
Lastpage :
47
Abstract :
A description is given of the causes of electric field clamping for thin-film electroluminescent (TFEL) devices. It is shown that clamped electric fields are highly dependent on emission-layer conductivity as well as on crystallinity. Clamped electric field strengths decrease with increases on conductivity, which can be controlled by emission-layer preparation methods and growth conditions. The clamping mechanism is also discussed. It is shown that the TFEL devices having low resistive emission layers produce more Joule heat and the electric field is clamped at a lower electric field strength.<>
Keywords :
electroluminescent displays; thin film devices; Joule heat; TFEL; crystallinity; electric field clamping; emission-layer conductivity; low resistive emission layers; thin film electroluminescent devices; threshold voltage; Charge measurement; Current measurement; Density measurement; Electroluminescent devices; Fluid flow; Indium tin oxide; Insulation; Thin film devices; Threshold voltage; Zinc compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Display Research Conference, 1988., Conference Record of the 1988 International
Conference_Location :
San Diego, CA, USA
Type :
conf
DOI :
10.1109/DISPL.1988.11271
Filename :
11271
Link To Document :
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