Designing a reliability demonstration test on a lithography expose tool using Bayesian techniques

Author

Villacourt, Mario ; Mahaney, Michael

Author_Institution

SEMATECH, Austin, TX, USA

fYear

1993

fDate

4-6 Oct 1993

Firstpage

254

Lastpage

261

Abstract

The Bayesian Reliability Testing method is used for the estimation of the shape and scale parameters of an inverted gamma prior distribution of the mean time between failures (MTBF) for equipment having an exponential time to failure distribution. This method allows the use of existing failure data of the equipment in question, provided certain conditions are satisfied. The Bayesian method is usable to update the prior distribution as new failure data becomes available. Through this updating process, confidence is built in to reliability demonstrations

Keywords

Bayes methods; failure analysis; integrated circuit manufacture; integrated circuit reliability; lithography; process control; reliability theory; statistical process control; Bayesian Reliability Testing method; confidence; exponential time to failure distribution; inverted gamma prior distribution; lithography expose tool; mean time between failures; reliability demonstration test; Bayesian methods; Fabrication; History; Lithography; Military standards; Qualifications; Stability; State estimation; Statistical analysis; System testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Electronic Manufacturing Technology Symposium, 1993, Fifteenth IEEE/CHMT International

Conference_Location

Santa Clara, CA

Print_ISBN

0-7803-1424-7

Type

conf

DOI

10.1109/IEMT.1993.398194

Filename

398194