Title :
Designing a reliability demonstration test on a lithography expose tool using Bayesian techniques
Author :
Villacourt, Mario ; Mahaney, Michael
Author_Institution :
SEMATECH, Austin, TX, USA
Abstract :
The Bayesian Reliability Testing method is used for the estimation of the shape and scale parameters of an inverted gamma prior distribution of the mean time between failures (MTBF) for equipment having an exponential time to failure distribution. This method allows the use of existing failure data of the equipment in question, provided certain conditions are satisfied. The Bayesian method is usable to update the prior distribution as new failure data becomes available. Through this updating process, confidence is built in to reliability demonstrations
Keywords :
Bayes methods; failure analysis; integrated circuit manufacture; integrated circuit reliability; lithography; process control; reliability theory; statistical process control; Bayesian Reliability Testing method; confidence; exponential time to failure distribution; inverted gamma prior distribution; lithography expose tool; mean time between failures; reliability demonstration test; Bayesian methods; Fabrication; History; Lithography; Military standards; Qualifications; Stability; State estimation; Statistical analysis; System testing;
Conference_Titel :
Electronic Manufacturing Technology Symposium, 1993, Fifteenth IEEE/CHMT International
Conference_Location :
Santa Clara, CA
Print_ISBN :
0-7803-1424-7
DOI :
10.1109/IEMT.1993.398194
