Title :
Statistical process control and the drive for six sigma in a VLSI pilot line
Author :
Nixon, P. ; Conway, J. ; Maimon, J.
Author_Institution :
IBM Federal Syst. Co., Manassas, VA, USA
Abstract :
The requirements of semiconductor device manufacturing and defense industry needs are continually demanding tighter process control and reduced levels of defects. Statistical process control (SPC) techniques are required to meet these requirements. The VLSI pilot line has implemented SPC control in manufacturing on all products. Online charts are used to identify and correct problems as quickly as possible and capability indices are used to drive continuous improvement
Keywords :
VLSI; integrated circuit manufacture; process control; quality control; statistical process control; TQM; VLSI pilot line; capability indices; closed loop control; defense industry needs; on-line charts; reduced levels of defects; semiconductor device manufacturing; six sigma; statistical process control; Application specific integrated circuits; Integrated circuit manufacture; Integrated circuit reliability; Management training; Manufacturing processes; Power capacitors; Process control; Six sigma; Total quality management; Very large scale integration;
Conference_Titel :
Electronic Manufacturing Technology Symposium, 1993, Fifteenth IEEE/CHMT International
Conference_Location :
Santa Clara, CA
Print_ISBN :
0-7803-1424-7
DOI :
10.1109/IEMT.1993.398199
