DocumentCode :
2669239
Title :
On the silicon nitride film formation from N/sub 2/-SiH/sub 4/ electron cyclotron resonance plasma
Author :
Sun-Kyu Song ; Hong-Young Chang
Author_Institution :
KAIST
fYear :
1993
fDate :
1-3 June 1993
Firstpage :
169
Lastpage :
169
Keywords :
Cyclotrons; Electrons; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma properties; Plasma x-ray sources; Resonance; Semiconductor films; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
Conference_Location :
Tampa, FL, USA
Print_ISBN :
0-7803-0716-X
Type :
conf
DOI :
10.1109/PLASMA.1992.697984
Filename :
697984
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2669239
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