DocumentCode
2669239
Title
On the silicon nitride film formation from N/sub 2/-SiH/sub 4/ electron cyclotron resonance plasma
Author
Sun-Kyu Song ; Hong-Young Chang
Author_Institution
KAIST
fYear
1993
fDate
1-3 June 1993
Firstpage
169
Lastpage
169
Keywords
Cyclotrons; Electrons; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma properties; Plasma x-ray sources; Resonance; Semiconductor films; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
Conference_Location
Tampa, FL, USA
Print_ISBN
0-7803-0716-X
Type
conf
DOI
10.1109/PLASMA.1992.697984
Filename
697984
Link To Document