DocumentCode :
2669420
Title :
Modeling Diamond Deposition In Microwave Assisted CVD Reactors
Author :
Hyman, Emily ; Tsang, K. ; Drobot, Adam ; Lane, Brett
Author_Institution :
Science Applications International Corporation
fYear :
1993
fDate :
1-3 June 1993
Firstpage :
170
Lastpage :
170
Keywords :
Chemical vapor deposition; Contracts; Electromagnetic heating; Electrons; Inductors; Microwave circuits; Microwave generation; Plasma applications; Plasma chemistry; Plasma density;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
Conference_Location :
Tampa, FL, USA
Print_ISBN :
0-7803-0716-X
Type :
conf
DOI :
10.1109/PLASMA.1992.697985
Filename :
697985
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2669420
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