• DocumentCode
    2670908
  • Title

    Thermomechanical reliability for emerging device technologies: Implications for ULK integration, 3-D structures and packaging

  • Author

    Dauskardt, Reinhold H.

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Stanford Univ., Stanford, CA, USA
  • fYear
    2009
  • fDate
    26-30 April 2009
  • Firstpage
    443
  • Lastpage
    443
  • Abstract
    In this paper, the author describes research aimed at characterizing thin-film thermomechanical properties including adhesion and cohesion that are critical for emerging device technologies. The author considers particular challenges of integrating nanostructured materials like nanoporous ULK materials and heterojunction layers in photovoltaic devices. Manipulating the composition and molecular structure of ULK materials is shown to optimize thermomechanical properties. Special consideration was given on strategies to produce molecularly reinforced ULK materials based on established organosilicate technologies, and post-deposition UV and e-beam curing with carefully engineered adjacent barrier layers to further optimize properties.
  • Keywords
    adhesion; bonding processes; chemical mechanical polishing; curing; electronics packaging; low-k dielectric thin films; semiconductor device reliability; semiconductor technology; thermomechanical treatment; 3D structure; ULK integration; device technology; electron beam curing; electronics packaging; heterojunction layers; molecular structure; nanoporous ULK material; organosilicate technology; photovoltaic device; post deposition UV curing; thermomechanical reliability; thin film thermomechanical property; Adhesives; Composite materials; Heterojunctions; Nanoporous materials; Nanostructured materials; Packaging; Photovoltaic systems; Solar power generation; Thermomechanical processes; Thin film devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 2009 IEEE International
  • Conference_Location
    Montreal, QC
  • ISSN
    1541-7026
  • Print_ISBN
    978-1-4244-2888-5
  • Electronic_ISBN
    1541-7026
  • Type

    conf

  • DOI
    10.1109/IRPS.2009.5173294
  • Filename
    5173294