Title :
Effect Of Collisions On Ion Dynamics In The Downstream Region of an ECR Plasma Etching Experiment
Author :
Hussein, M.Z.B. ; Emmert ; Hershkowitz, Noah ; Woods, R.C.
Author_Institution :
University of Wisconsin
Keywords :
Electrons; Etching; Plasma applications; Plasma materials processing; Plasma properties; Plasma simulation; Plasma sources; Plasma temperature; Polymer films; Radio frequency;
Conference_Titel :
Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
Conference_Location :
Tampa, FL, USA
Print_ISBN :
0-7803-0716-X
DOI :
10.1109/PLASMA.1992.698002
