Title :
Breakdown voltage walkout effect in ESD protection devices
Author :
LaFonteese, D.J. ; Vashchenko, V.A. ; Korablev, K.G.
Author_Institution :
Nat. Semicond. Corp., Santa Clara, CA, USA
Abstract :
Using experimental and numerical simulation analysis the breakdown voltage walkout effect has been studied in 40 V ESD protection devices based on extended drain MOS devices implemented in a 5 V CMOS process. A similar effect has been observed in 100 V and 24 V BiCMOS processes. The physical mechanism of this effect is revealed as the result of hot electron capture in the thick field oxide of the extended drain region. To address this, a method to reduce the walkout effect in high voltage ESD devices is proposed and experimentally validated.
Keywords :
BiCMOS integrated circuits; CMOS integrated circuits; MOSFET; electrostatic discharge; hot carriers; semiconductor device breakdown; BiCMOS process; CMOS process; ESD protection device; breakdown voltage walkout effect; drain region; extended drain MOS device; hot electron capture; voltage 100 V; voltage 24 V; voltage 40 V; voltage 5 V; BiCMOS integrated circuits; Breakdown voltage; CMOS process; Clamps; Current measurement; Electrostatic discharge; Protection; Pulse measurements; Thyristors; Transmission line measurements; ESD; breakdown; hot carrier degradation;
Conference_Titel :
Reliability Physics Symposium, 2009 IEEE International
Conference_Location :
Montreal, QC
Print_ISBN :
978-1-4244-2888-5
Electronic_ISBN :
1541-7026
DOI :
10.1109/IRPS.2009.5173325