Modeling of heat transfer for laser-assisted direct nano imprint processing

The melting duration and molten depth are key information for laser-assisted direct imprinting, which raises issues about the melting & solidification induced by excimer-pulse-laser irradiating through unilaterally transparent binary materials. Considering the size-effect on thermal conductivity and phase-change of irradiated material, the thermal-contact resistance is taken into account to simulate and predict the melting behavior for this process. Results in this study indicate that the laser-annealing case as well as the perfect-contact case provides the upper-bound and the lower-bound values for the physical quantities involved in this process even without the detail information of the changing values of thermal-contact resistance