Title :
The mechanism of device damage during bump process for flip-chip package
Author :
Lee, Jian-Hsing ; Shih, J.R. ; Tang, Chin-Hsin ; Niu, Pao-Kang ; Perng, D.-J. ; Lin, Y.-T. ; Su, David ; Wu, Kenneth
Author_Institution :
Taiwan Semicond. Manuf. Co., Hsinchu, Taiwan
Abstract :
Ring-type yield loss at wafer edge has been observed during flip-chip packaging process. The failure mechanism is attributed to the scrubber clean process step which generates a lot of charges. This in turn behaves like an electrostatic discharge (ESD) event and damages gate oxide of internal circuits. An equivalent circuit is proposed to analyze such a kind of ESD event and proves the importance of the parasitic capacitance of the interconnect metal.
Keywords :
chip scale packaging; electrostatic discharge; equivalent circuits; failure analysis; flip-chip devices; device damage mechanism; electrostatic discharge event; equivalent circuit; failure mechanism; flip-chip package bump process; ring-type yield loss; scrubber clean process; Circuits; Electrostatic discharge; Failure analysis; Insulation; Manufacturing processes; Semiconductor device manufacture; Semiconductor device modeling; Semiconductor device packaging; Variable structure systems; Wafer scale integration;
Conference_Titel :
Reliability Physics Symposium, 2009 IEEE International
Conference_Location :
Montreal, QC
Print_ISBN :
978-1-4244-2888-5
Electronic_ISBN :
1541-7026
DOI :
10.1109/IRPS.2009.5173328