DocumentCode :
2672330
Title :
Critical thermal issues in nanoscale IC design
Author :
Jiang, Lei ; Pantuso, Daniel ; Sverdrup, Per G. ; Shih, Wei-kai
Author_Institution :
Design Technol. & Solutions, Intel Corp., Hillsboro, OR, USA
fYear :
2009
fDate :
26-30 April 2009
Firstpage :
909
Lastpage :
912
Abstract :
A key design challenge for microprocessor is the increasing constraint on power density from platform, process, and reliability physics. Accurate prediction of thermal performance during design convergence is an opportunity of innovation for next-generation processor designs. To achieve best-in-class reliability and to address failure mechanism such as electromigration and Joule heating, we need a self-consistent modeling methodology that allows thermal predictions from device to interconnect at all length scales. Here we discuss the challenges in thermal scaling and various thermal modeling tools applied at Intel for architecture pathfinding, reliability verification, and design validation.
Keywords :
electromigration; failure analysis; finite element analysis; integrated circuit design; integrated circuit interconnections; integrated circuit reliability; microprocessor chips; thermal analysis; Intel; Joule heating; architecture pathfinding; design convergence; design validation; electromigration; failure mechanism; microprocessor; nanoscale IC design; power density; reliability physics; reliability verification; self-consistent modeling methodology; thermal modeling; thermal performance; thermal scaling; Analytical models; Electromigration; Heat sinks; Heating; Microprocessors; Physics; Silicon; Temperature; Thermal conductivity; Thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 2009 IEEE International
Conference_Location :
Montreal, QC
ISSN :
1541-7026
Print_ISBN :
978-1-4244-2888-5
Electronic_ISBN :
1541-7026
Type :
conf
DOI :
10.1109/IRPS.2009.5173378
Filename :
5173378
Link To Document :
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