DocumentCode :
2674539
Title :
Future trend of ULSI technology and its influence on semiconductor industry
Author :
Shibayama, Kyoichi
Author_Institution :
Mitsubishi Electr. Corp., Hyogo, Japan
fYear :
1989
fDate :
17-19 May 1989
Firstpage :
7
Lastpage :
12
Abstract :
Ultra-large-scale integrated circuits (ULSIs), in which more than 10 million active elements are embedded, will be realized in the early 1990s. The current status of candidate technologies supporting ULSI, such as lithography, film formation, interconnection and characterization of device structure, is examined. Problems left in the areas of design, testing, devices with physically new elements, and simplification of fabrication process to meet with performance, reliability, and economic requirements are discussed, and solutions are considered
Keywords :
VLSI; electronics industry; integrated circuit manufacture; integrated circuit technology; IC production; ULSI technology; fabrication process; film formation; interconnection; lithography; semiconductor industry; CMOS technology; Cost function; Dielectric thin films; Electronics industry; Fabrication; Integrated circuit technology; Large scale integration; Random access memory; Research and development; Ultra large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, Systems and Applications, 1989. Proceedings of Technical Papers. 1989 International Symposium on
Conference_Location :
Taipei
Type :
conf
DOI :
10.1109/VTSA.1989.68572
Filename :
68572
Link To Document :
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