Title :
Measuring of composition of Cd1−XZnxTe layer by spectral ellipsometry method
Author_Institution :
Inst. of Semicond. Phys., SB RAS, Novosibirsk, Russia
Abstract :
The technique for precise control of the composition of in-situ heteroepitaxial layers cadmium-zinc-tellurium (CZT) by the spectral ellipsometry method is proposed. Various features of spectrum of triple compound of CZT are considered. Special attention is paid to the spectrum parts close to the critical points E0, E0+Delta0, E1 and E1+Delta1. The dependence of energy location of fundamental absorption edge E0 on composition is the most evident. Various methods are tried for the determination of E0 spectrum location. The simplest model of the dependence of dielectric functions on the composition close to absorption edge is built. The spectra calculation with the usage of the model of dielectric functions allows one to raise the determination accuracy of the composition of CZT appreciably. The verification of the technique is carried out ex-situ on set of samples grown by the method of molecular beam epitaxy (MBE).
Keywords :
II-VI semiconductors; cadmium compounds; dielectric function; ellipsometry; molecular beam epitaxial growth; optical constants; reflectivity; semiconductor epitaxial layers; wide band gap semiconductors; Cd1-xZnxTe; critical points; dielectric functions; fundamental absorption edge; heteroepitaxial layers; molecular beam epitaxy; optical constants; reflectivity factors; spectral ellipsometry method; Absorption; Ellipsometry; Molecular beam epitaxial growth; Optical buffering; Optical films; Optical polarization; Optical sensors; Photodetectors; Reflectivity; Substrates; Ellipsometry; composition; molecular beam epitaxy (MBE);
Conference_Titel :
Micro/Nanotechnologies and Electron Devices, 2009. EDM 2009. International Conference and Seminar on
Conference_Location :
Novosibirsk
Print_ISBN :
978-1-4244-4571-4
DOI :
10.1109/EDM.2009.5173912