Title :
Optical properties of amorphous silicon thin films deposited by plasma chemical jet method
Author :
Strunin, V.I. ; Baranova, L.V. ; Lyahov, A.A. ; Popov, V.V. ; Hudaybergenov, G.J. ; Jacob, S.S.
Author_Institution :
Omsk State Univ., Omsk, Russia
Abstract :
Plasma chemical jet method for deposition of amorphous silicon films is discussed. Optical properties of films are analyzed.
Keywords :
amorphous semiconductors; elemental semiconductors; plasma CVD; plasma materials processing; semiconductor thin films; silicon; solar cells; Si; amorphous silicon thin films; jet deposition; optical property; plasma chemical jet method; solar cell; Amorphous silicon; Chemicals; Optical films; Plasma chemistry; Plasma properties; Plasma temperature; Radio frequency; Semiconductor thin films; Sputtering; Substrates; Plasma; amorphous silicon; jet deposition; solar cell;
Conference_Titel :
Micro/Nanotechnologies and Electron Devices, 2009. EDM 2009. International Conference and Seminar on
Conference_Location :
Novosibirsk
Print_ISBN :
978-1-4244-4571-4
DOI :
10.1109/EDM.2009.5173929
