Title :
An independent dual gate SOI FinFET soft-error resilient memory cell
Author :
Eftaxiopoulos, N. ; Axelos, N. ; Zervakis, G. ; Tsoumanis, K. ; Pekmestzi, K.
Author_Institution :
Dept. of Comput. Sci., Nat. Tech. Univ. of Athens, Athens, Greece
Abstract :
In this paper we present an 8T footless storage element, the FFDICE (FinFET DICE), a dual interlocked structure using Independent Gate SOI FinFET transistors that exhibits soft error resilience characteristics. Compared to the conventional DICE cell, the proposed design achieves area savings by dispensing with the four NMOS driver transistors, retains the excellent tolerance characteristics to single node upsets and similar multiple node upset resilience. Of significance to modern designs that apply voltage scaling techniques to achieve power savings, simulation results on Static Voltage Noise Margin and Static Current Noise Margin metrics show that the proposed cell exhibits excellent stability across an examined voltage range of 0.75V to 1V.
Keywords :
MOS integrated circuits; SRAM chips; elemental semiconductors; integrated circuit design; radiation hardening (electronics); silicon-on-insulator; 8T footless storage element; FFDICE; FinFET DICE; NMOS driver transistors; dual-interlocked structure; independent dual-gate SOI FinFET soft-error resilient memory cell; multiple-node upset resilience; power savings; single-node upsets; soft error resilience characteristics; static current noise margin metric; static voltage noise margin metric; tolerance characteristic; voltage 0.75 V to 1 V; voltage scaling technique; FinFETs; Logic gates; Noise; Resilience; Threshold voltage;
Conference_Titel :
Design & Test Symposium (IDT), 2014 9th International
Conference_Location :
Algiers
DOI :
10.1109/IDT.2014.7038584