• DocumentCode
    2677231
  • Title

    Silicon avalanche diodes for direct detection of nuclear particles

  • Author

    Chistokhin, I.B. ; Pchelyakov, O.P. ; Tishkovsky, E.G. ; Obodnikov, V.I. ; Maksimov, V.V. ; Ivanov, A.A. ; Pinzhenin, E.I. ; Gramsch, E.

  • Author_Institution
    Siberian Div., Russian Acad. of Sci., Novosibirsk, Russia
  • fYear
    2009
  • fDate
    1-6 July 2009
  • Firstpage
    359
  • Lastpage
    362
  • Abstract
    The junction termination extension (JTE) avalanche diode (AD) for direct detection of nuclear particles was built with the use of planar technology processing. The active area of the detector with JTE structure have been processed simultaneously, by one implantation of boron step followed by the diffusion up to the depth of 14 mum. The contact layer (p+ region) had the thickness of 80 nm and was created by a molecular beam epitaxy to get the energy detection threshold as low as possible. The breakdown voltage of this device was as high as 1130 V. The gain measured under the visible light and protons with the energy 25 keV irradiation was as high as 25. The amplitude of the response of these diodes to the single alpha-particle with the energy 2.5 MeV corresponded to the equivalent gain value more then 3000.
  • Keywords
    avalanche diodes; electric breakdown; elemental semiconductors; molecular beam epitaxial growth; proton effects; silicon; silicon radiation detectors; Si; breakdown voltage; contact layer; energy detection threshold; junction termination extension; molecular beam epitaxy; nuclear particle detection; proton irradiation; silicon avalanche diodes; size 14 micron; size 80 nm; visible light irradiation; Boron; Detectors; Doping; Molecular beam epitaxial growth; P-n junctions; Physics; Plasmas; Protons; Semiconductor diodes; Silicon; Avalanche diode; gain; particle detection; silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro/Nanotechnologies and Electron Devices, 2009. EDM 2009. International Conference and Seminar on
  • Conference_Location
    Novosibirsk
  • Print_ISBN
    978-1-4244-4571-4
  • Type

    conf

  • DOI
    10.1109/EDM.2009.5174011
  • Filename
    5174011