3D mask modules using two-photon direct laser writingtechnology for continuous lithography process on fibers

In this paper, we report a new fabrication method of three dimensional (3D) mask modules using two-photon direct laser writing technology in 140 μm-diameter half-pipe structure on quartz substrates. For the first time, the two-photon direct laser writing technology is successfully utilized for high-resolution patterning process on a curved surface. The minimum feature sizes of about 2 μm are successfully fabricated in the 140 μm-diameter half-pipe structure. Using the new 3D mask modules, fine metal patterns are prepared on 125 μm-diameter fiber. The results demonstrated that the preparation of the 3D mask modules became more feasible by using the new method, and thus could be expected in the practical application of 3D photolithography process on fibers.