DocumentCode :
2677893
Title :
Parasitic effects on nanoassembly processes
Author :
Wich, Thomas ; Stolle, Christian ; Edeler, Christoph ; Fatikow, Sergej
Author_Institution :
Dept. of Comput. Sci., Univ. of Oldenburg, Oldenburg, Germany
fYear :
2009
fDate :
10-15 Oct. 2009
Firstpage :
1389
Lastpage :
1394
Abstract :
This paper analyzes the disturbance sources acting on nano-assembly systems inside the scanning electron microscope, which complicate the automation of assembly processes in the scanning electron microscope. The influence of intrinsic sources, i.e. thermal drift, actuator offset and end effector vibrations due to actuator movements are examined and approaches are suggested. The electron-beam interaction with the assembly system has been identified as another disturbance source and its impact on automated assembly processes is qualified and quantified. Solutions for disturbance-resistant assembly processes are suggested.
Keywords :
actuators; assembling; end effectors; industrial manipulators; scanning electron microscopes; actuator movements; actuator offset; disturbance sources; disturbance-resistant assembly processes; electron-beam interaction; end effector vibrations; intrinsic sources; nanoassembly processes; parasitic effects; scanning electron microscope; thermal drift; Actuators; Assembly systems; End effectors; Instruments; Intelligent robots; Mechanical sensors; Scanning electron microscopy; Tactile sensors; USA Councils; Vibrations;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Intelligent Robots and Systems, 2009. IROS 2009. IEEE/RSJ International Conference on
Conference_Location :
St. Louis, MO
Print_ISBN :
978-1-4244-3803-7
Electronic_ISBN :
978-1-4244-3804-4
Type :
conf
DOI :
10.1109/IROS.2009.5354016
Filename :
5354016
Link To Document :
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