• DocumentCode
    267877
  • Title

    High aspect ratio, Large area silicon-based gratings for X-ray phase contrast imaging

  • Author

    Baborowski, J. ; Revol, V. ; Kottler, C. ; Kaufmann, Richard ; Niedermann, P. ; Cardot, F. ; Dommann, A. ; Neels, A. ; Despont, Michel

  • Author_Institution
    CSEM SA, Neuchatel, Switzerland
  • fYear
    2014
  • fDate
    26-30 Jan. 2014
  • Firstpage
    490
  • Lastpage
    493
  • Abstract
    This paper reports on the latest developments in the manufacturing of high aspect ratio silicon-based gratings used for X-ray phase contrast imaging (XPCI). Grating-based XPCI provides, in one measurement, unique information about the absorption coefficient, the index of refraction and the microscopic structure of a sample at hard X-ray frequencies. For this reason, XPCI can potentially overcome the limitations of classical absorption-based radiography, notably for weakly absorbing materials. New micro-fabrication processes were developed to manufacture full set of large area and high aspect ratio X-ray gratings with few defects. The complementarity of XPCI with conventional absorption-based radiography was experimentally demonstrated.
  • Keywords
    X-ray imaging; absorption coefficients; diffraction gratings; elemental semiconductors; microfabrication; microsensors; radiography; refractive index; silicon; Si; X-ray frequency; X-ray phase contrast imaging; XPCI; absorbing materials; absorption coefficient; absorption-based radiography; high aspect ratio; microfabrication process; refraction index; sample microscopic structure; silicon-based gratings; Absorption; Gold; Gratings; Imaging; Silicon; X-ray imaging;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems (MEMS), 2014 IEEE 27th International Conference on
  • Conference_Location
    San Francisco, CA
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2014.6765684
  • Filename
    6765684