Title :
Nanofiber forests with high infrared absorptance
Author :
Mao, H.Y. ; Lei, Changhui ; Chen, Y.J. ; Chen, Z.J. ; Ou, Weixin ; Wu, W.G. ; Ming, A.J. ; Chen, D.P.
Author_Institution :
Key Lab. of Microelectron. Devices & Integrated Technol., Inst. of Microelectron., Beijing, China
Abstract :
In this work, nanofiber forests with high infrared (IR) absorptance are reported. In wavelength range from 1.5 to 5 μm, the absorptance of the nanofiber forests reaches a minimum of 96%, which is much higher than that of Si3N4-based IR absorbers and the polymer coatings from which the nanofibers are obtained. Such nanofiber forests are fabricated by using a plasma-stripping-of-polymer technique, which is fast, high-yield and applicable to a wide range of polymers. Moreover, the technique is highly compatible with micro-fabrication. As a result, the nanofiber forests can be introduced into MEMS (Micro-Electro-Mechanical systems) IR devices, and it is expected that the performance of such devices can be improved.
Keywords :
infrared spectra; light absorption; micro-optics; microfabrication; micromechanical devices; nanophotonics; plasma materials processing; polymers; silicon compounds; MEMS; Si3N4; high infrared absorptance fiber; microelectromechanical systems; microfabrication process; nanofiber forests; plasma stripping-of-polymer technique; polymer coatings; wavelength 1.5 mum to 5 mum; Fabrication; Micromechanical devices; Nanoscale devices; Plasmas; Polymers; Resists; Substrates;
Conference_Titel :
Micro Electro Mechanical Systems (MEMS), 2014 IEEE 27th International Conference on
Conference_Location :
San Francisco, CA
DOI :
10.1109/MEMSYS.2014.6765723
