DocumentCode :
2679920
Title :
Copper CVD precursors and processes for advanced metallization
Author :
Doppelt, P.
Author_Institution :
ESPCI-CNRS, Laboratoire de Chimie Inorganique
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
23
Lastpage :
24
Keywords :
Chemical reactors; Chemical vapor deposition; Copper; Design optimization; Equations; Inorganic materials; Integrated circuit interconnections; Integrated circuit metallization; Liquids; Termination of employment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1998.887498
Filename :
887498
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2679920
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