DocumentCode :
2679962
Title :
Design and application of ultrathin SOI MOSFETs
Author :
Yoshimi, Makoto
Author_Institution :
Toshiba Corp., Kawasaki, Japan
fYear :
1989
fDate :
3-5 Oct 1989
Firstpage :
145
Lastpage :
146
Abstract :
Summary form only given. The fundamental electric properties of ultrathin SOI MOSFETs are reviewed and their prospects are discussed. Ultrathin SOI MOSFETs provide a viable LSI technology where there is a possibility that ultimate performance of MOS devices can be realized. The operation limit of ultrathin SOI MOSFETs should be pursued both theoretically and experimentally. Basic concepts for device optimization should be established. At the same time, detailed characterization of ultrathin SOI devices should be continued. The development of crystal technology is not crucial for the development of the device technology
Keywords :
MOS integrated circuits; insulated gate field effect transistors; integrated circuit technology; large scale integration; semiconductor technology; semiconductor-insulator boundaries; LSI technology; Si-SiO2; detailed characterization; device optimization; device technology; fundamental electric properties; operation limit; prospects; ultimate performance; ultrathin SOI MOSFETs; Carrier confinement; Doping; Electric breakdown; Energy barrier; Fluctuations; Impurities; MOS devices; MOSFETs; Silicon; Ultra large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOS/SOI Technology Conference, 1989., 1989 IEEE
Conference_Location :
Stateline, NV
Type :
conf
DOI :
10.1109/SOI.1989.69807
Filename :
69807
Link To Document :
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