DocumentCode

2680040

Title

Rapid thermal low pressure chemical vapor deposition of TiN layers from the TiCI₄-NH₃-H₂ gaseous phase

Author

Bouteville, A. ; Imhoff, L. ; Remy, J.C.

Author_Institution

Ecole Nationale Superieure d´´Arts et Metiers

fYear

1997

fDate

16-19 March 1997

Firstpage

43

Lastpage

44

Keywords

Atomic layer deposition; Chemical vapor deposition; Conductivity; Inductors; Inorganic materials; Metallization; Silicon; Temperature; Tin; Titanium;

fLanguage

English

Publisher

ieee

Conference_Titel

Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop

Conference_Location

Villard de Lans, France

ISSN

1266-0167

Type

conf

DOI

10.1109/MAM.1998.887505

Filename

887505