DocumentCode :
2680181
Title :
Integration evaluation of low permittivity silicon based spin an materials as IMD
Author :
Pires, F. ; Noël, P. ; Lecornec, Ch ; Passemard, G.
Author_Institution :
CEA Grenoble LETI GRESSI
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
68
Lastpage :
70
Keywords :
Adhesives; Dielectric constant; Dielectric materials; Inorganic materials; Permittivity; Plasma applications; Plasma chemistry; Plasma materials processing; Resists; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1998.887515
Filename :
887515
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2680181
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