DocumentCode :
2680190
Title :
SiOF and SiO
2
deposition in a HDP reactor: tool characterisation and film analysis
Author :
den Boer, D.J. ; Fukuda, H. ; van der Hilst, J.B.C. ; Kalkman, A.J. ; Janssen, G.C.A.M. ; Radelaar, S.
Author_Institution :
Dimes, Delft University
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
71
Lastpage :
73
Keywords :
Aluminum; Conductors; Dielectric materials; Filling; Inductors; Inorganic materials; Metallization; Plasma applications; Plasma density; Sputtering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1998.887516
Filename :
887516
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2680190
