DocumentCode

2680202

Title

Cleaning after silicon oxide CMP

Author

Tardif, F. ; Mansart, I. ; Lardin, T. ; Demolliens, O. ; Fayolle, M. ; Gobile, Y. ; Palleau, J. ; Torres, J.

Author_Institution

GRESSI-LETI-CEA/G

fYear

1997

fDate

16-19 March 1997

Firstpage

74

Lastpage

77

Keywords

Chemical technology; Cleaning; Contamination; Dielectrics; Hafnium; Inorganic materials; Metallization; Planarization; Silicon; Slurries;

fLanguage

English

Publisher

ieee

Conference_Titel

Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop

Conference_Location

Villard de Lans, France

ISSN

1266-0167

Type

conf

DOI

10.1109/MAM.1998.887517

Filename

887517