DocumentCode :
2680877
Title :
Thermal stability of thin CoSi2 layers on polysilicon implanted with As, BF2 and Si
Author :
La Via, F. ; Alberti, Alessandra ; Raineri, V. ; Ravesi, S. ; Rimini, E.
Author_Institution :
CNR-IMETEM
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
181
Lastpage :
183
Keywords :
Annealing; Atomic measurements; Cobalt; Electrical resistance measurement; Force measurement; Silicides; Silicon; Substrates; Temperature; Thermal stability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1998.887566
Filename :
887566
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2680877
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