• DocumentCode
    2680877
  • Title

    Thermal stability of thin CoSi2 layers on polysilicon implanted with As, BF2 and Si

  • Author

    La Via, F. ; Alberti, Alessandra ; Raineri, V. ; Ravesi, S. ; Rimini, E.

  • Author_Institution
    CNR-IMETEM
  • fYear
    1997
  • fDate
    16-19 March 1997
  • Firstpage
    181
  • Lastpage
    183
  • Keywords
    Annealing; Atomic measurements; Cobalt; Electrical resistance measurement; Force measurement; Silicides; Silicon; Substrates; Temperature; Thermal stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
  • Conference_Location
    Villard de Lans, France
  • ISSN
    1266-0167
  • Type

    conf

  • DOI
    10.1109/MAM.1998.887566
  • Filename
    887566
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2680877