DocumentCode :
2680941
Title :
Reaction sequence of thin ni films with [001] 3C-SiC
Author :
Gasser, S.M. ; Bachli, A. ; Kolawa, E. ; Nicolet, M.A.
Author_Institution :
California Institute of Technology
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
191
Lastpage :
191
Keywords :
Annealing; Backscatter; Chemical elements; Mass spectroscopy; Microstructure; Nickel; Phase detection; Silicon carbide; Temperature; X-ray diffraction;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1998.887570
Filename :
887570
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2680941
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