DocumentCode :
2681000
Title :
Patterning of silicide layers by local oxidation
Author :
Klinkhammer, F. ; Dolle, M. ; Mantl, S.
Author_Institution :
Institut fur Schicht- und lonentechnik
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
199
Lastpage :
200
Keywords :
Atomic layer deposition; Molecular beam epitaxial growth; Oxidation; Protection; Scanning electron microscopy; Semiconductor process modeling; Silicides; Silicon; Stress; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1998.887574
Filename :
887574
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2681000
بازگشت