DocumentCode

2681090

Title

Sputter deposition and characterization of TiB₂/TiSi₂ bilayer contact structure

Author

Sade, G. ; Pelleg, J.

Author_Institution

Ben-Gurion Univ. of the Negev - Beer-Sheva

fYear

1997

fDate

16-19 March 1997

Firstpage

210

Lastpage

212

Keywords

Amorphous materials; Annealing; Boron; Copper; Metallization; Semiconductor films; Silicides; Sputtering; Temperature distribution; Titanium;

fLanguage

English

Publisher

ieee

Conference_Titel

Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop

Conference_Location

Villard de Lans, France

ISSN

1266-0167

Type

conf

DOI

10.1109/MAM.1998.887580

Filename

887580