مرکز منطقه ای اطلاع رساني علوم و فناوري - Sputter deposition and characterization of TiB<sub>2</sub>/TiSi<sub>2</sub> bilayer contact structure

DocumentCode :

2681090

Title :

Sputter deposition and characterization of TiB₂/TiSi₂ bilayer contact structure

Author :

Sade, G. ; Pelleg, J.

Author_Institution :

Ben-Gurion Univ. of the Negev - Beer-Sheva

fYear :

1997

fDate :

16-19 March 1997

Firstpage :

210

Lastpage :

212

Keywords :

Amorphous materials; Annealing; Boron; Copper; Metallization; Semiconductor films; Silicides; Sputtering; Temperature distribution; Titanium;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop

Conference_Location :

Villard de Lans, France

ISSN :

1266-0167

Type :

conf

DOI :

10.1109/MAM.1998.887580

Filename :

887580

Link To Document :