مرکز منطقه ای اطلاع رساني علوم و فناوري - TaSiN barrier layer for the oxygen diffusion

DocumentCode :

2681100

Title :

TaSiN barrier layer for the oxygen diffusion

Author :

Hara, T. ; Tanaka, M. ; Kobayashi, T. ; Kitamura, T.

Author_Institution :

Hosei University

fYear :

1997

fDate :

16-19 March 1997

Firstpage :

213

Lastpage :

215

Keywords :

Annealing; Capacitors; Conductivity; Contact resistance; Electrodes; Leakage current; Oxidation; Oxygen; Radio frequency; Sputtering;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop

Conference_Location :

Villard de Lans, France

ISSN :

1266-0167

Type :

conf

DOI :

10.1109/MAM.1998.887581

Filename :

887581

Link To Document :