DocumentCode :
2682316
Title :
Cyclotron resonance: From E.O. Lawrence to microchips
Author :
Shohet, J.L.
fYear :
1990
fDate :
21-23 May 1990
Firstpage :
108
Abstract :
Summary form only given. First used by E.O. Lawrence for the cyclotron particle accelerator, cyclotron resonance motion has had a major impact on many aspects of plasma science, ranging from microwave power generation such as in the magnetron tube, precise mass measurement, isotope separation and plasma heating and processing for microelectronics and other materials applications. Cyclotron motion can also be produced by time-varying electric fields as well as swept frequency excitation. In the plasma processing area. cyclotron resonance is being studied for applications in the production of new materials with unusual and superior properties, for developing new chemical compounds and processes, and for altering and refining materials and surfaces. It has direct applications to semiconductor fabrication, materials synthesis, polymers, anticorrosion coatings, machine tools, metallurgy, electrical and electronics devices, hazardous waste removal, and high-performance ceramics
Keywords :
plasma applications; plasma heating; anticorrosion coatings; cyclotron particle accelerator; cyclotron resonance; electrical devices; electronics devices; hazardous waste removal; high-performance ceramics; isotope separation; machine tools; magnetron tube; mass measurement; materials applications; materials refinement; metallurgy; microchips; microelectronics; microwave power generation; plasma; plasma heating; plasma processing; polymers; semiconductor fabrication; surface refinement; swept frequency excitation; time-varying electric fields;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
Conference_Location :
Oakland, CA, USA
Type :
conf
DOI :
10.1109/PLASMA.1990.110569
Filename :
5725845
Link To Document :
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