DocumentCode
2682696
Title
RF reference cell for plasma etching studies
Author
Hargis, P.J., Jr.
fYear
1990
fDate
21-23 May 1990
Firstpage
118
Abstract
Summary form only given. The reference cell was designed with three objectives: (1) the cell should be easily duplicated so that the design can be portable among laboratories: (2) the cell should be fabricated with as many standard components as possible to keep costs down; and (3) the cell should accommodate a variety of diagnostic techniques, including. but not limited to, optical emission, laser spectroscopy, mass spectroscopy, and probes. The reference cell consists of a stainless-steel vacuum chamber with 4-in.-diameter water-cooled parallel-plate electrodes. Gas is injected into the discharge through a showerhead in the upper electrode and is pumped out through a symmetrical pumping configuration. Two 8-in. ports. two 6-in. ports. and four 2.75-in. ports are provided for various diagnostic measurements, including mass spectrometer sampling through the lower electrode. Flexibility is achieved by allowing the electrodes to be independently powered, grounded, floating, or biased
Keywords
plasma diagnostic techniques; sputter etching; 2.75 in; 4 in; 6 in; 8 in; RF reference cell; biased electrode; diagnostic techniques; floating electrodes; grounded electrode; independently powered electrodes; laser spectroscopy; mass spectroscopy; optical emission; plasma etching; showerhead; stainless-steel vacuum chamber; symmetrical pumping configuration; water-cooled parallel-plate electrodes;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
Conference_Location
Oakland, CA, USA
Type
conf
DOI
10.1109/PLASMA.1990.110592
Filename
5725868
Link To Document