• DocumentCode
    2682696
  • Title

    RF reference cell for plasma etching studies

  • Author

    Hargis, P.J., Jr.

  • fYear
    1990
  • fDate
    21-23 May 1990
  • Firstpage
    118
  • Abstract
    Summary form only given. The reference cell was designed with three objectives: (1) the cell should be easily duplicated so that the design can be portable among laboratories: (2) the cell should be fabricated with as many standard components as possible to keep costs down; and (3) the cell should accommodate a variety of diagnostic techniques, including. but not limited to, optical emission, laser spectroscopy, mass spectroscopy, and probes. The reference cell consists of a stainless-steel vacuum chamber with 4-in.-diameter water-cooled parallel-plate electrodes. Gas is injected into the discharge through a showerhead in the upper electrode and is pumped out through a symmetrical pumping configuration. Two 8-in. ports. two 6-in. ports. and four 2.75-in. ports are provided for various diagnostic measurements, including mass spectrometer sampling through the lower electrode. Flexibility is achieved by allowing the electrodes to be independently powered, grounded, floating, or biased
  • Keywords
    plasma diagnostic techniques; sputter etching; 2.75 in; 4 in; 6 in; 8 in; RF reference cell; biased electrode; diagnostic techniques; floating electrodes; grounded electrode; independently powered electrodes; laser spectroscopy; mass spectroscopy; optical emission; plasma etching; showerhead; stainless-steel vacuum chamber; symmetrical pumping configuration; water-cooled parallel-plate electrodes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
  • Conference_Location
    Oakland, CA, USA
  • Type

    conf

  • DOI
    10.1109/PLASMA.1990.110592
  • Filename
    5725868