DocumentCode :
2682744
Title :
Tolerance of pulsed discharges to contamination by gas phase particulates
Author :
McCaughey ; Kushner, Mark J.
fYear :
1990
fDate :
21-23 May 1990
Firstpage :
119
Abstract :
Summary form only given. The consequences of contamination of pulsed gas discharges by gas-phase particulates were studied theoretically. This study was performed with a multidimensional continuum model for a glow discharge sustained in rare gases in which a distribution of dust is specified. The continuum model integrates the conservation and transport equations for excited states and ions, while driving the plasma with an external circuit. Electron impact rate coefficients are obtained from a lookup table in which they are cataloged as a function of E/N and dust density, as well as other pertinent parameters such as fractional ionization. These rate coefficients were obtained by separately parameterizing a Monte Carlo simulation performed previously. Variations in dust density of less than tens of percents across the bore of the discharge tube (dust density ≈105 cm-3) were sufficient to cause constriction and arcing of the plasma. Wall-generated contamination leads to arcing along the axis; volumetrically generated contamination leads to constriction along the walls. Tolerances of rare gas discharges against instabilities caused by contamination were investigated
Keywords :
discharges (electric); plasma impurities; Monte Carlo simulation; arcing; conservation; constriction; discharge tube; distribution; dust; electron impact rate coefficient; excited states; external circuit; fractional ionization; gas phase particulates; glow discharge; inert gas; instabilities; ions; lookup table; multidimensional continuum model; pulsed discharges; rare gases; tolerance; transport equations; volumetrically generated contamination; wall generated contamination;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
Conference_Location :
Oakland, CA, USA
Type :
conf
DOI :
10.1109/PLASMA.1990.110595
Filename :
5725871
Link To Document :
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