DocumentCode :
2683276
Title :
A new PSO-based approach to study the nanoscale DG MOSFETs
Author :
Bendib, T. ; Djeffal, F. ; Abdi, M.A.
Author_Institution :
Dept. of Electron., Univ. of Batna, Batna, Algeria
fYear :
2010
fDate :
23-25 March 2010
Firstpage :
1
Lastpage :
5
Abstract :
The Double Gate (DG) MOSFET has been proposed as potential alternative to the conventional bulk CMOS structure for extended CMOS scalability beyond 30 nm partly due to its immunity to short channel effects. So, the objective of this work is to provide an accurate drain current model based on an automatic parameter extraction method with PSO (Particle Swarm Optimization) for Current-Voltage-based MOSFET models. Extracted parameter values reproduce I-V characteristics within 5% RMS error for wide range of gate lengths. It is shown that the I-V characteristics predicted by our analytical model are in close agreement with 2-D numerical simulation results.
Keywords :
CMOS integrated circuits; MOSFET; numerical analysis; particle swarm optimisation; 2D numerical simulation; I-V characteristics; automatic parameter extraction method; current-voltage-based MOSFET model; drain current model; extended CMOS scalability; nanoscale double gate MOSFET; particle swarm optimization; short channel effects; Analytical models; Computational modeling; Databases; MOSFETs; Nanoscale devices; Numerical simulation; Parameter extraction; Particle swarm optimization; Semiconductor device modeling; Space technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design and Technology of Integrated Systems in Nanoscale Era (DTIS), 2010 5th International Conference on
Conference_Location :
Hammamet
Print_ISBN :
978-1-4244-6338-1
Type :
conf
DOI :
10.1109/DTIS.2010.5487571
Filename :
5487571
Link To Document :
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