Title :
Preparation of copper clad laminates with high performance bismaleimide-based copolymer matrix resins
Author :
Zhou, Hongfu ; Wang, Jianbin
Author_Institution :
Yantai Darbond Electron. Mater. Co., Ltd., Yantai, China
Abstract :
4,4´-Diphenyl Bismaleimide/Diallyl Bisphenol A/Bisphenol-A Cyanate Ester/Epoxy Resin copolymer matrix resins were developed by fusion prepolymerization and solution prepolymerization method, and use the bismaleimide (BMI)-based copolymer matrix resins/glass fabric prepared for copper clad laminates, which illustrate Tg at 230.7°C, dielectric constant at 3.57(1MHz) and dielectric loss constant at 0.0053(1MHz), volume resistivity at 2.3×1013Ω·cm and surface resistivity at 2.4×1015Ω, thermal expansion coefficient at 1.1×10-5/°C (x y-axis) and 5.7×10-5/°C (z-axis), dip soldering of resistance(288°C) is more than 62s, peel strength at 16.7N/cm, flexural strength at 458.3MP, moisture absorption at 0.19%, the test results explain that the performance is better than Japanese product copper clad laminates with bismaleimide/triazine-based resin(BT resin).
Keywords :
adhesion; bending strength; claddings; copper; dielectric losses; electrical resistivity; filled polymers; glass transition; laminates; moisture; permittivity; polymer blends; polymerisation; resins; surface resistance; thermal expansion; 4,4´-diphenyl bismaleimide-diallyl bisphenol A-bisphenol-A cyanate ester-epoxy resin copolymer matrix resins; Cu; bismaleimide-based copolymer matrix resins; copper clad laminates; dielectric constant; dielectric loss; flexural strength; fusion prepolymerization; glass fabric; glass transition; moisture absorption; peel strength; solution prepolymerization; surface resistivity; thermal expansion coefficient; volume resistivity; Absorption; Glass; Polymers; Resins; Temperature; Thermal expansion; bismaleimide-based copolymer matrix resins; copper clad laminate; dielectric properties; heat resistance; mechanical properties; thermal expansion coefficient;
Conference_Titel :
Advanced Packaging Materials (APM), 2011 International Symposium on
Conference_Location :
Xiamen
Print_ISBN :
978-1-4673-0148-0
DOI :
10.1109/ISAPM.2011.6105742