DocumentCode :
2683797
Title :
Substrate leakage loss of an optical waveguide fabricated on a high-index material
Author :
Yamauchi, Junji ; Fujita, Yoshikazu ; Shibayama, Jun ; Nakano, Hisamatsu
Author_Institution :
Fac. of Eng., Hosei Univ., Tokyo, Japan
Volume :
2
fYear :
2003
fDate :
15-19 Dec. 2003
Abstract :
The leakage loss of an optical waveguide fabricated on a Si substrate is investigated using the beam-propagation method. The leakage losses of three-dimensional waveguides are compared with those of two-dimensional ones.
Keywords :
elemental semiconductors; finite difference methods; optical fabrication; optical films; optical losses; optical waveguides; silicon; Si; Si substrate; SiO2-Si; beam-propagation method; high-index material; optical waveguide; substrate leakage loss; three-dimensional waveguides; two-dimensional waveguides ones; Integrated optics; Optical films; Optical filters; Optical losses; Optical materials; Optical planar waveguides; Optical refraction; Optical variables control; Optical waveguides; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
Print_ISBN :
0-7803-7766-4
Type :
conf
DOI :
10.1109/CLEOPR.2003.1277178
Filename :
1277178
Link To Document :
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