DocumentCode :
2683967
Title :
PBFA II applied B ion diode beam characteristics at high voltages
Author :
Johnson, D.J.
fYear :
1990
fDate :
21-23 May 1990
Firstpage :
143
Lastpage :
144
Abstract :
Summary form only given. An applied B-field ion diode has been operated at 10 MW on PBFA II to study high-voltage ion beam generation and transport physics. The radial focusing diode was powered at 25 TW with two conical self-magnetically-insulated transmission lines with and without plasma opening switches. The diode utilized a pair of B-field coils in disk cathode structures to produce a 3.5-T axial B-field in a 16-mm anode-cathode gap. The 15-cm-radius anode was configured with a 2-5-cm-tall ion emitting region. The 2.5-MA beam generated was transported toward the axis in a 13-cm-radius gas cell with a 2-μm-thick Mylar window and 5-torr argon gas fill. Four B-field coils in the anode structure adjusted the magnetic insulation along the anode surface so that the beam could be produced with nearly zero canonical angular momentum for any ion species or anode shape. Diagnostic measurements involving the voltage at the diode, diode and beam current, nuclear activation, witness plate damage, and Rutherford scattering images were obtained
Keywords :
ion sources; plasma devices; 10 MW; 2.5 MA; 25 TW; 3.5 T; B-field coils; Mylar window; PBFA II; Rutherford scattering; anode-cathode gap; applied B-field ion diode; beam current; canonical angular momentum; conical self-magnetically-insulated transmission lines; diagnostics; diode voltage; gas fill; high voltages; ion emitting region; magnetic insulation; nuclear activation; plasma opening switches; radial focusing diode; transport physics; witness plate damage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
Conference_Location :
Oakland, CA, USA
Type :
conf
DOI :
10.1109/PLASMA.1990.110667
Filename :
5725940
Link To Document :
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