DocumentCode
2684147
Title
Lanthanum fluoride optical thin films deposited by resistive heater with ion-assisted at room temperature
Author
Liu, Ming-Chung ; Lee, Cheng-Chug ; Tung, Chi-Hong
Author_Institution
Inst. of Opt. Sci., Nat. Central Univ., Chung-li, Taiwan
Volume
2
fYear
2003
fDate
15-19 Dec. 2003
Abstract
Lanthanum fluoride (LaF3) optical thin film prepared by resistive heater at room temperature has been investigated. The working parameters of ion source in the ion-assisted process strongly influence the optical behavior and surface morphology of the deposited film in UV and visible regimes.
Keywords
antireflection coatings; ion beam assisted deposition; lanthanum compounds; optical films; surface morphology; ultraviolet spectra; visible spectra; 20 degC; LaF3; UV regime; ion-assisted process; lanthanum fluoride optical thin films; optical behavior; resistive heater; room temperature; surface morphology; thin film deposition; visible regime; Coatings; Lanthanum; Optical films; Optical materials; Optical surface waves; Optimized production technology; Particle beam optics; Surface morphology; Temperature; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
Print_ISBN
0-7803-7766-4
Type
conf
DOI
10.1109/CLEOPR.2003.1277198
Filename
1277198
Link To Document