DocumentCode :
2684255
Title :
Broadband plasma absorber
Author :
Vidmar, R.J.
fYear :
1990
fDate :
21-23 May 1990
Firstpage :
150
Abstract :
Summary form only given, as follows. A tenuous plasma generated in a background gas at atmospheric pressure is highly collisional. The cold collisional dispersion relation was used to model electromagnetic effects. For a plasma generated by a point source such as an ultraviolet flash lamp the electron number density decreases as a function of distance from the source. An Epstein profile was used to model the plasma gradient. Calculations based on an Epstein profile quantify the reflection coefficient and absorption for propagation through the plasma as a function of frequency. These effects were quantified for air and noble gases. Generation of plasma can be achieved by photoionization of the organic vapor TMAE and containment in a thin shell Mylar structure. This containment vessel has low backscatter and is suitable for electromagnetic measurements
Keywords :
electromagnetic wave propagation in plasma; plasma collision processes; Epstein profile; TMAE; absorption; air; atmospheric pressure; background gas; backscatter; broadband plasma absorber; cold collisional dispersion relation; containment vessel; electromagnetic effects; electromagnetic measurements; electron number density; highly collisional plasma; inert gas; noble gases; organic vapor; photoionization; plasma gradient; point source; propagation; reflection coefficient; tenuous plasma; thin shell Mylar structure; ultraviolet flash lamp;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
Conference_Location :
Oakland, CA, USA
Type :
conf
DOI :
10.1109/PLASMA.1990.110683
Filename :
5725956
Link To Document :
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