Title :
A plasma-based source of pulsed microwave and millimeter wavelength radiation
Author :
Liou, Richard ; Figueroa ; Kirkman-Amemiya, G. ; Temkin, Richard J. ; McCurdy, A.H. ; Fetterman, H. ; Gundersen, M.A.
Abstract :
Summary form only given. Experimental evidence was obtained for the generation of pulsed microwave and millimeter-wave radiation in the range of 20 to above 100 GHz resulting from a beam-plasma interaction in a back-lighted thyratron or pseudospark. The device supports an intense, low-emittance electron beam and a high-density glow-mode plasma. The back-lighted thyratron and pseudospark were used as a high-current switch for pulsed power applications and produce electron beams with high brightness and low emittance, suggesting a beam-plasma interaction which can produce electromagnetic waves. Time-resolved measurements indicate that the electron beam and radiation occur simultaneously. The beam has ≈120-A peak current with energy 10-20 keV. These devices produce high plasma densities for devices that operate repeatably in a pulsed mode. The plasma is produced in a low-pressure gas (~100-mtorr Ar). The radiation is produced during the transient period when the plasma is being formed. Typical pulse lengths are of the order of the time for the formation of the plasma. which varies with circuit parameters and gas pressure
Keywords :
microwave generation; plasma applications; sparks; thyratrons; 10 to 20 keV; 100 mtorr; 120 A; 20 to 100 GHz; back-lighted thyratron; beam-plasma interaction; brightness; circuit parameters; electron beams; emittance; gas pressure; high-current switch; high-density glow-mode plasma; low-emittance electron beam; low-pressure gas; millimeter wavelength radiation; peak current; plasma-based source; pseudospark; pulsed microwave radiation source; pulsed power applications; time-resolved measurement; transient period;
Conference_Titel :
Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
Conference_Location :
Oakland, CA, USA
DOI :
10.1109/PLASMA.1990.110689