• DocumentCode
    2684669
  • Title

    Low energy metal ion beam source

  • Author

    Godechot, X. ; Brown, I.G.

  • fYear
    1990
  • fDate
    21-23 May 1990
  • Firstpage
    159
  • Lastpage
    160
  • Abstract
    Summary form only given. A high-current metal ion source has been developed in which a metal vapor vacuum arc is used as the plasma discharge mechanism, by means of which high-current beams of a wide range of multiply charged metal ions can be produced. Operating the source in a mode suitable for very-low-energy beam formation, in the approximate range of 100 eV to 2 keV, which might be useful for ion-beam-assisted deposition and other plasma processing applications, has been investigated. The beam formation electrodes (extractor grids) were reconfigured to work in an almost-symmetric accelerating-decelerating potential arrangement. In preliminary tests, an accelerating voltage that was limited to just 4 kV was used, and a titanium ion beam with a current of up to 100 mA at 1.5-kV net beam voltage was produced. It is anticipated that low-energy metal ion beams with current up to the 1-A level should be obtainable with an optimized grid spacing and an accelerating voltage of 10-20 kV
  • Keywords
    ion beams; ion sources; metals; 1 A; 1.5 kV; 10 to 20 kV; 100 eV to 2 keV; 100 mA; 4 kV; accelerating voltage; almost-symmetric accelerating-decelerating potential arrangement; high-current; low energy metal ion beam source; metal vapor vacuum arc; multiply charged metal ions; optimized grid spacing; plasma discharge mechanism; very-low-energy beam formation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
  • Conference_Location
    Oakland, CA, USA
  • Type

    conf

  • DOI
    10.1109/PLASMA.1990.110708
  • Filename
    5725980